Lithographic apparatus, metrology system, and intensity imbalance measurement for error correction
US12326670B2 · kind B2 · utility
0Cited by
5References
20Claims
0Family size
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Key dates
| Filing date | Jul 24, 2021 |
| Grant date | Jun 10, 2025 |
| Priority date | — |
| Expiry date | Feb 28, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/706851
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A metrology system includes a beam splitter and first and second sensors. The beam splitter splits scattered radiation scattered by a target into first and second portions of radiation. The first sensor receives the first portion. The second sensor receives the second portion after the second portion propagates along a path that includes a wedge system comprising a first wedge configured to diverge the second portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.