Earl William Ebert
13Patents
4h-index
20Co-inventors
60Inventor score
Filing activity: Feb 13, 1989 → Jul 24, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5187543A | Differential displacement measuring interferometer | Physics | 52 | Expired |
| US5028137A | Angular displacement measuring interferometer | Physics | 10 | Expired |
| US7134321B2 | Fluid gauge proximity sensor and method of operating same using a modulated fluid flow | Physics | 8 | Expired |
| US8508736B2 | Tunable wavelength illumination system | Physics | 6 | Active |
| US7021121B2 | Gas gauge proximity sensor with a modulated gas flow | Physics | 4 | Expired |
| US8730476B2 | Tunable wavelength illumination system | Physics | 3 | Active |
| US9632434B2 | Reticle cooling system in a lithographic apparatus | Physics | 2 | Active |
| US9632433B2 | Patterning device support, lithographic apparatus, and method of controlling patterning device temperature | Physics | 2 | Active |
| US9766557B2 | Patterning device support, lithographic apparatus, and method of controlling patterning device temperature | Physics | 1 | Active |
| USRE42650E1 | Fluid gauge proximity sensor and method of operating same using a modulated fluid flow | General | 0 | Active |
| US9977351B2 | Patterning device support, lithographic apparatus, and method of controlling patterning device temperature | Physics | 0 | Active |
| US12326670B2 | Lithographic apparatus, metrology system, and intensity imbalance measurement for error correction | Physics | 0 | Active |
| US9891540B2 | Measuring method, measurement apparatus, lithographic apparatus and device manufacturing method | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.