Apparatus for smoothly exhausting the atmosphere in a processing space when rotating a substrate with liquid
US12331399B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 29, 2021 |
| Grant date | Jun 17, 2025 |
| Priority date | — |
| Expiry date | Dec 31, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/162
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for processing a substrate includes a first processing unit configured to have a first processing container having a first inner space and a first support unit supporting and rotating the substrate in the first inner space; a second processing unit configured to have a second processing container having a second inner space and a second support unit supporting and rotating the substrate in the second inner space; an exhaust unit configured to exhaust the first and the second inner space; a first exhaust pipe configured to have a first exhaust port for introducing atmosphere of the first inner space and exhaust the atmosphere introduced through the first exhaust port to the integrated duct; and a second exhaust pipe configured to have a second exhaust port for introducing atmosphere of the second inner space and exhaust the atmosphere introduced through the second exhaust port to the integrated duct.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.