Variable hardness amorphous carbon mask
US12341009B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 21, 2022 |
| Grant date | Jun 24, 2025 |
| Priority date | — |
| Expiry date | Jan 31, 2044 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02274
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of fabricating an amorphous carbon layer (ACL) mask includes forming an ACL on an underlying layer. The ACL includes a soft ACL portion that has a first hardness and a hard ACL portion that has a second hardness. The soft ACL portion underlies the hard ACL portion. The second hardness is greater than the first hardness. The method further includes forming a patterned layer over the ACL and forming an ACL mask by etching through both the soft ACL portion and the hard ACL portion of the ACL to expose the underlying layer using the patterned layer as an etch mask. Forming the ACL may include depositing one or both of the soft ACL portion and the hard ACL portion. Processing conditions may also be varied while forming the ACL to create a hardness gradient that transitions from softer to harder.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.