Patent · US Active

Chamber device, gas laser device, and electronic device manufacturing method

US12347995B2 · kind B2 · utility

0Cited by
0References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 10, 2023
Grant dateJul 1, 2025
Priority date
Expiry dateFeb 7, 2044

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01S3/225
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A chamber device includes a housing into which a laser gas is filled, a pair of discharge electrodes generating light from the laser gas when a voltage is applied thereto, a window arranged at a wall surface of the housing and transmitting the light therethrough, a first fan causing the laser gas to flow between the discharge electrodes, a filter, a second fan rotating together with the first fan by a drive force of a drive source of the first fan, a fan-side flow path causing the laser gas filtered by the filter to flow by the second fan and a part of the laser gas to flow in a direction away from the window, and a window-side flow path communicating with the fan-side flow path and causing the laser gas flowing from the fan-side flow path by the second fan to flow toward the window.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.