Total or local thickness variation for optical devices

US12353009B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Yingdong Luo · Newark, US
• Zhengping Yao · Cupertino, US
• Daihua Zhang · Newark, US
• David Alexander SELL · Santa Clara, US
• Jingyi Yang · Beijing, CN
• Xiaopei Deng · Cedar Park, US
• Kevin Messer · Mountain View, US
• Samarth Bhargava · Saratoga, US
• Rami Hourani · Santa Clara, US
• Ludovic Godet · Sunnyvale, US

Key dates

• Filing date: Apr 8, 2024
• Grant date: Jul 8, 2025
• Expiry date: Apr 8, 2044

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B27/0081
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Embodiments of the present disclosure generally relate to methods for forming a waveguide. Methods may include measuring a waveguide substrate, the waveguide having a substrate thickness distribution; and depositing an index-matched layer onto a surface of the waveguide, the index-matched layer having a first surface disposed on the waveguide substrate and a second surface opposing the first surface, wherein the index-matched layer is disposed only over a portion of the waveguide substrate, and a device slope of a second surface of the index-matched layer is substantially the same as the waveguide slope of the first surface of the waveguide.