Fixture and method for determining position of a target in a reaction chamber
US12354893B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 13, 2021 |
| Grant date | Jul 8, 2025 |
| Priority date | — |
| Expiry date | Jul 16, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68742
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A fixture includes a frame, a leveling plate, a bracket, and a laser profiler. The frame is arranged for fixation above a reaction chamber arranged to deposit a film onto a substrate. The leveling plate is supported on the frame. The bracket is supported on the leveling plate. The laser profiler is suspended from the bracket, overlays the reaction chamber, and has a field of view that extends through the leveling plate and the frame to determine position of a target within the reaction chamber. Semiconductor processing systems and methods of determining position of targets within reaction chambers in semiconductor processing systems are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.