Xing Lin
30Patents
5h-index
76Co-inventors
68Inventor score
Filing activity: Oct 22, 2010 → Jun 30, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10950477B2 | Ceramic heater and esc with enhanced wafer edge performance | Electricity | 264 | Active |
| US8633423B2 | Methods and apparatus for controlling substrate temperature in a process chamber | Emerging Cross-Sectional Technologies | 121 | Active |
| US9123762B2 | Substrate support with symmetrical feed structure | Electricity | 36 | Active |
| US10403535B2 | Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system | Electricity | 7 | Active |
| USD1030687S1 | Susceptor | General | 6 | Active |
| US9725806B2 | Multi-zone pedestal for plasma processing | Electricity | 5 | Active |
| US8982530B2 | Methods and apparatus toward preventing ESC bonding adhesive erosion | Emerging Cross-Sectional Technologies | 4 | Active |
| US11764101B2 | Susceptor for semiconductor substrate processing | Electricity | 3 | Active |
| USD1067204S1 | Susceptor | General | 3 | Active |
| US11053591B2 | Multi-port gas injection system and reactor system including same | Electricity | 2 | Active |
| US10879041B2 | Method and apparatus of achieving high input impedance without using ferrite materials for RF filter applications in plasma chambers | Electricity | 2 | Active |
| US9948214B2 | High temperature electrostatic chuck with real-time heat zone regulating capability | Performing Operations; Transporting | 1 | Active |
| US8492980B2 | Methods for calibrating RF power applied to a plurality of RF coils in a plasma processing system | Electricity | 1 | Active |
| US10090187B2 | Multi-zone pedestal for plasma processing | Electricity | 1 | Active |
| US10692703B2 | Ceramic heater with enhanced RF power delivery | Electricity | 1 | Active |
| USD1031676S1 | Combined susceptor, support, and lift system | General | 1 | Active |
| US10770328B2 | Substrate support with symmetrical feed structure | Electricity | 0 | Active |
| US12417933B2 | Wafer far edge temperature measurement system with lamp bank alignment | Physics | 0 | Active |
| US12112938B2 | Semiconductor processing preclean methods and apparatus | Electricity | 0 | Active |
| US12394659B2 | Susceptors with film deposition control features | Electricity | 0 | Active |
| US12006572B2 | Reactor system including a gas distribution assembly for use with activated species and method of using same | Electricity | 0 | Active |
| US12234554B2 | Semiconductor deposition reactor and components for reduced quartz devitrification | Electricity | 0 | Active |
| US10811301B2 | Dual-zone heater for plasma processing | Electricity | 0 | Active |
| US10497606B2 | Dual-zone heater for plasma processing | Electricity | 0 | Active |
| US10096494B2 | Substrate support with symmetrical feed structure | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.