Semiconductor inspection apparatus and semiconductor inspection method using the same
US12362139B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 19, 2022 |
| Grant date | Jul 15, 2025 |
| Priority date | — |
| Expiry date | Dec 11, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Disclosed are semiconductor inspection apparatuses and methods. The semiconductor inspection apparatus comprises a stage that supports a semiconductor device, a first column that irradiates a first electron beam toward the semiconductor device on the stage, a second column that irradiates a second electron beam toward the semiconductor device, and a detector that detects a secondary electron generated by the second electron beam. The first column is disposed to make a first angle with a top surface of the semiconductor device. The second column is disposed to make a second angle with the top surface of the semiconductor device. The first angle and the second angle are different from each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.