Chungsam Jun
14Patents
2h-index
43Co-inventors
46Inventor score
Filing activity: Jul 9, 2015 → Aug 9, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9466537B2 | Method of inspecting semiconductor device and method of fabricating semiconductor device using the same | Electricity | 3 | Active |
| US9719946B2 | Ellipsometer and method of inspecting pattern asymmetry using the same | Physics | 2 | Active |
| US9612212B1 | Ellipsometer and method of inspecting pattern asymmetry using the same | Physics | 2 | Active |
| US11754510B2 | Inspection system of semiconductor wafer and method of driving the same | Electricity | 1 | Active |
| US12352808B2 | Substrate inspection apparatus and substrate inspection method | Physics | 0 | Active |
| US10269111B2 | Method of inspecting semiconductor wafer, an inspection system for performing the same, and a method of fabricating semiconductor device using the same | Physics | 0 | Active |
| US9583402B2 | Method of manufacturing a semiconductor device using semiconductor measurement system | Electricity | 0 | Active |
| US11988495B2 | Through-focus image-based metrology device, operation method thereof, and computing device for executing the operation | Physics | 0 | Active |
| US12130242B2 | Inspection system of semiconductor wafer and method of driving the same | Electricity | 0 | Active |
| US11754517B2 | Inspection apparatus for inspecting semiconductor devices using charged particles | Electricity | 0 | Active |
| US9455121B2 | Semiconductor inspection system and methods of inspecting a semiconductor device using the same | Electricity | 0 | Active |
| US12362139B2 | Semiconductor inspection apparatus and semiconductor inspection method using the same | Electricity | 0 | Active |
| US9892980B2 | Fan-out panel level package and method of fabricating the same | Electricity | 0 | Active |
| US10088297B2 | Apparatus and method for measuring thickness | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.