Gas management method and substrate processing system
US12371784B2 · kind B2 · utility
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7Claims
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Key dates
| Filing date | Sep 14, 2022 |
| Grant date | Jul 29, 2025 |
| Priority date | — |
| Expiry date | Sep 14, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A gas management method includes: heating a raw material container that accommodates a raw material, by a heater, thereby generating a vaporized raw material gas; supplying the vaporized raw material gas together with a carrier gas to a processing container that accommodates a substrate, thereby performing a processing on the substrate; and controlling the heater based on a weight of the substrate after the processing on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.