Coolant channel with internal fins for substrate processing pedestals
US12381105B2 · kind B2 · utility
0Cited by
1References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 18, 2021 |
| Grant date | Aug 5, 2025 |
| Priority date | — |
| Expiry date | May 27, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67109
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A baseplate for a substrate support in a substrate processing system includes at least one coolant channel formed within the baseplate. The at least one coolant channel defines a volume within the baseplate configured to retain a coolant and follows a path configured to distribute the coolant in the volume throughout the baseplate. At least one fin is provided within the at least one coolant channel. The at least one fin extends from at least one of a top, a bottom, and a sidewall of the at least one coolant channel into the volume to increase a surface area of the at least one coolant channel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.