Plasma processing with broadband RF waveforms
US12387910B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 22, 2024 |
| Grant date | Aug 12, 2025 |
| Priority date | — |
| Expiry date | May 22, 2044 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/24564
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma system includes a plasma apparatus comprising a plasma chamber and a substrate support disposed in the plasma chamber. The system includes an electromagnetic (EM) circuit block coupled to a radio frequency (RF) electrode. The EM circuit block includes a broadband RF waveform function generator, the broadband RF waveform having EM power distributed over a range of frequencies, and a broadband impedance matching network having an input coupled to an output of the broadband RF waveform function generator and an output coupled to a terminal of the RF electrode, an operating frequency range of the broadband impedance matching network including the range of frequencies. The system includes a controller programmed to adjust an input parameter of the EM circuit block.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.