Double-sided scrubber for substrate cleaning
US12387946B2 · kind B2 · utility
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15Claims
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Key dates
| Filing date | Oct 5, 2023 |
| Grant date | Aug 12, 2025 |
| Priority date | — |
| Expiry date | Oct 5, 2043 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B2203/02
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A substrate cleaning device includes a double-sided scrubber that directs a liquid to a substrate as it moves back-and-forth between a pair of rotating brushes. The device may also include a first set of nozzles and a second set of nozzles. The first set of nozzles may be configured to spray a first liquid at an interface between the substrate and rotating brushes and the second set of nozzles may be configured to spray a second liquid at the interface as the substrate moves back-and-forth between the pair of rotating brushes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.