Combined ocd and photoreflectance method and system
US12392733B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 24, 2020 |
| Grant date | Aug 19, 2025 |
| Priority date | — |
| Expiry date | May 25, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8835
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A combined OCD and photoreflectance system and method for improving the OCD performance in measurements of optical properties of a target sample. The system comprises (a) either a single channel OCD set-up comprised of a single probe beam configured in a direction normal/oblique to the target sample or a multi-channel OCD set-up having multiple probe beams configured in normal and oblique directions to the target sample for measuring the optical properties of the target sample, (b) at least one laser source for producing at least one laser beam, (c) at least one modulation device to turn the at least one laser beam into at least one alternatingly modulated laser beam, and (d) at least one spectrometer for measuring spectral components of the at least one light beam reflecting off said target sample; wherein the at least one alternatingly modulated laser beam is alternatingly modulating the spectral reflectivity of the target sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.