Positive working photosensitive material
US12393115B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 3, 2019 |
| Grant date | Aug 19, 2025 |
| Priority date | — |
| Expiry date | Jul 28, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/42
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed herein is a photosensitive composition comprising a) at least one photoacid generator; b) at least one Novolak polymer; c) at least one acrylate polymer, comprising a component having structure (I); d) at least one glycidyl hydroxy benzoic acid condensate material comprising one or more compounds having structure (II); e) at least one heterocyclic thiol compound comprising a ring structure chosen from the general structures (III), (IIIa) or (IIIb); and f) at least one solvent. Disclose herein are also the methods of using this composition to form a resist pattern and the methods of using these resist patterns to produce metal lines. Disclosed herein are also compounds and mixtures of compounds having structure (II).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.