Balanced RF resonant antenna system
US12394600B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 28, 2023 |
| Grant date | Aug 19, 2025 |
| Priority date | — |
| Expiry date | Nov 4, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01Q9/27
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
According to an embodiment, a plasma processing system includes a plasma chamber, an RF source, a matching circuit, a balun, and a resonating antenna. The resonating antenna includes a first and a second spiral resonant antenna (SRA), each having an electrical length corresponding to a quarter of a wavelength of a frequency of a forward RF wave generated by the RF source. The first end of the first SRA is coupled to a first balanced terminal of the balun and the second end of the first SRA is open circuit. The first end of the second SRA is coupled to a second balanced terminal of the balun and the second end of the second SRA is open circuit. The first and the second SRA are arranged in a symmetrically nested configuration having a same center point.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.