Impedance transformation in radio-frequency-assisted plasma generation
US12394601B2 · kind B2 · utility
0Cited by
57References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 10, 2024 |
| Grant date | Aug 19, 2025 |
| Priority date | — |
| Expiry date | Apr 10, 2044 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH03H7/40
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus for providing signals to a device may include one or more radiofrequency signal generators, and electrically-small transmission line, which couples signals from the one or more RF signal generators to the fabrication chamber. The apparatus may additionally include a reactive circuit to transform impedance of the electrically-small transmission line from a region of relatively high impedance-sensitivity to region of relatively low impedance-sensitivity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.