Apparatuses for uniform fluid delivery in a multi-station semiconductor processing chamber

US12400880B2 · kind B2 · utility

Assignee

• Lam Research Corporation · US

Inventors

• Eli Jeon · Sherwood, US
• Michael Philip Roberts · Tigard, US
• Douglas Walter Agnew · Portland, US
• Daniel Boatright · Estacada, US
• Arun Anandhan Duraisamy · Wilsonville, US
• Joseph R. Abel · West Linn, US
• William Laurence McDaniel · West Linn, US

Key dates

• Filing date: Apr 28, 2022
• Grant date: Aug 26, 2025
• Expiry date: May 22, 2042

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/6719
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

The present disclosure relates to a system for a semiconductor processing. The system includes a semiconductor processing chamber having a plurality of processing stations, a plurality of manifold trunks, a plurality of valves, and a plurality of fluid manifolds. Each manifold trunk includes an outlet, a common flowpath, a plurality of trunk inlets, a plurality of orifices, and a plurality of valve interfaces.