Patent · US Active

Apparatus and method of substrate edge cleaning and substrate carrier head gap cleaning

US12400881B2 · kind B2 · utility

0Cited by
1References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 18, 2023
Grant dateAug 26, 2025
Priority date
Expiry dateOct 18, 2043

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/68721
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The present disclosure relates to load cups that include an annular substrate station configured to receive a substrate. The annular substrate station surrounds a nebulizer located within the load cup. The nebulizer includes a set of energized fluid nozzles disposed on an upper surface of the nebulizer adjacent to an interface between the annular substrate station and the nebulizer. The set of energized fluid nozzles are configured to release energized fluid at an upward angle relative to the upper surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.