Patent · US Active

Projection objective including an optical device

US12411417B2 · kind B2 · utility

0Cited by

7References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Johannes Lippert · Buch am Wald, DE
Toralf Gruner · Hennef (Sieg), DE
Kerstin Hild · Schwäbisch Gmünd, DE
Hans-Michael Stiepan · Aalen, DE
Thilo Pollak · Neresheim, DE
Jeffrey Cavaco · Boylston, US

Key dates

Filing date	Jan 12, 2023
Grant date	Sep 9, 2025
Priority date	—
Expiry date	Apr 20, 2043

Classification

Technology area (CPC H)Electricity
CPC primaryH10N30/802
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A projection exposure apparatus comprises a projection objective, and the projection objective comprises an optical device, wherein the optical device comprises an optical element having an optically effective surface and an electrostrictive actuator. The electrostrictive actuator is deformable by a control voltage being applied. The electrostrictive actuator is functionally connected to the optical element to influence the surface shape of the optically effective surface. A control device supplies the electrostrictive actuator with the control voltage. A measuring device is configured, at least at times while the electrostrictive actuator influences the optically effective surface of the optical element, to measure directly and/or to determine indirectly the temperature and/or a temperature change of the electrostrictive actuator and/or the surroundings thereof to take account of a temperature-dependent influence during driving of the electrostrictive actuator by the control device.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.