Apparatus for treating substrate and method for treating substrate
US12412767B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Nov 4, 2022 |
| Grant date | Sep 9, 2025 |
| Priority date | — |
| Expiry date | Dec 5, 2043 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB25J11/0095
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a first process treating unit configured to treat a substrate in a single-type method; a second process treating unit configured to treat a substrate in a batch-type method; and a posture changing unit provided between the first process treating unit and the second process treating unit and configured to change a posture of the substrate between a vertical posture and a horizontal posture, and wherein the substrate is loaded to and unloaded from the first process treating unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.