Gas injection system and reactor system including same
US12428726B2 · kind B2 · utility
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2,213References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 1, 2020 |
| Grant date | Sep 30, 2025 |
| Priority date | — |
| Expiry date | Jun 27, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A gas injection system, a reactor system including the gas injection system, and methods of using the gas injection system and reactor system are disclosed. The gas injection system can be used in gas-phase reactor systems to independently monitor and control gas flow rates in a plurality of channels of a gas injection system coupled to a reaction chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.