Phase-resolved optical metrology for substrates
US12429418B2 · kind B2 · utility
0Cited by
3References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 14, 2023 |
| Grant date | Sep 30, 2025 |
| Priority date | — |
| Expiry date | May 28, 2044 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/126
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The methods and apparatus provide phase-resolved optical metrology for determining qualities of a substrate and films thereon. Transmitted and reflected signals are coupled using both amplitude and phase information to improve the metrology information obtained from film layers on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.