Radial flow reactor including glow discharge limiting shield

US4033287A · kind A · utility

Assignee

• Bell Telephone Laboratories, Inc. · US

Inventors

• Frank B. Alexander, Jr. · Paterson, US
• Cesar D. Capio · Fords, US
• Victor E. Hauser, Jr. · Palmerton, US
• Hyman J. Levinstein · Berkeley Heights, US
• Cyril J. Mogab · New Providence, US
• Ashok Sinha · Palo Alto, US
• Richard S. Wagner, II · Loveland, US

Key dates

• Filing date: Jan 22, 1976
• Grant date: Jul 5, 1977
• Expiry date: Jan 22, 1996

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/5096
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

An improved radio frequency (rf) powered radial flow cylindrical reactor utilizes a gas shield which substantially limits the glow plasma discharge reaction to a section of the reactor over the semiconductor substrates which are to be coated. The gas shield permits the use of higher rf input power which contributes to the formation of protective films that have desirable physical and electrical characteristics.