Patent · US Expired

Method of exposure by means of corpuscular beam shadow printing

US4169230A · kind A · utility

19Cited by

2References

2Claims

0Family size

Assignee

International Business Machines Corporation · US

Inventors

Harald Bohlen · Eppelheim, DE
Johann Greschner · Neckartenzlingen, DE
Werner Kulcke · Eppelheim, DE
Peter Nehmiz · Stuttgart, DE

Key dates

Filing date	May 8, 1978
Grant date	Sep 25, 1979
Priority date	—
Expiry date	May 8, 1998

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3007
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A method of exposure of a target object by means of corpuscular beam shadow printing through a mask with several complementary zones wherein the beam, shiftable and tiltable about a point in the mask plane and arranged in parallel at a small distance from the target object, is first impinged upon a first of the complementary zones, then the object is shifted under a second of the complementary zones, and the positioning of the beam is changed so that any deviation of the actual position of the second area of the target object to be exposed from its nominal position is determined and compensated for by tilting the beam about a point substantially in the mask plane.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.