Peter Nehmiz
13Patents
10h-index
10Co-inventors
61Inventor score
Filing activity: May 8, 1978 → Jan 25, 1985
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4426584A | Method of compensating the proximity effect in electron beam projection systems | Electricity | 52 | Expired |
| US4448865A | Shadow projection mask for ion implantation and ion beam lithography | Electricity | 44 | Expired |
| US4370554A | Alignment system for particle beam lithography | Electricity | 27 | Expired |
| US4417946A | Method of making mask for structuring surface areas | Emerging Cross-Sectional Technologies | 26 | Expired |
| US4504558A | Method of compensating the proximity effect in electron beam projection systems | Electricity | 24 | Expired |
| US4591540A | Method of transferring a pattern into a radiation-sensitive layer | Physics | 22 | Expired |
| US4169230A | Method of exposure by means of corpuscular beam shadow printing | Electricity | 19 | Expired |
| US4554458A | Electron beam projection lithography | Electricity | 13 | Expired |
| US4513203A | Mask and system for mutually aligning objects in ray exposure systems | Electricity | 12 | Expired |
| US4578587A | Error-corrected corpuscular beam lithography | Electricity | 12 | Expired |
| US4334156A | Method of shadow printing exposure | Electricity | 10 | Expired |
| US4342817A | Mask for structuring surface areas, and method of making it | Emerging Cross-Sectional Technologies | 10 | Expired |
| US4267259A | Exposure process | Emerging Cross-Sectional Technologies | 3 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.