Magnetron sputtering target and cathode assembly
US4198283A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 6, 1978 |
| Grant date | Apr 15, 1980 |
| Priority date | — |
| Expiry date | Nov 6, 1998 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3435
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A magnetron cathode assembly for use in a cathode sputtering apparatus includes a support means for a rectangular frame-like annular target and spaced apart inner and outer pole pieces fastened to the support member and providing a rectangular annular channel for mounting the target in electrically and thermally conductive contact with the support means. Preferably, the target is a set of four straight bars shaped at the ends to assemble together as a rectangular frame. Target bars having a symmetrical hourglass cross section with overhanging flanged side portions adjacent to front and rear faces are adapted to be reversibly clamped to the support means by the inner and outer poles for simple and rapid replacement in the field, said hourglass shape providing maximum utilization of target material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.