Steven Hurwitt
46Patents
22h-index
27Co-inventors
85Inventor score
Filing activity: Oct 3, 1974 → May 24, 2002
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5415753A | Stationary aperture plate for reactive sputter deposition | Electricity | 543 | Expired |
| US5126028A | Sputter coating process control method and apparatus | Electricity | 155 | Expired |
| US4957605A | Method and apparatus for sputter coating stepped wafers | Electricity | 92 | Expired |
| US4422896A | Magnetically enhanced plasma process and apparatus | Electricity | 81 | Expired |
| US4909695A | Method and apparatus for handling and processing wafer-like materials | Emerging Cross-Sectional Technologies | 70 | Expired |
| US4198283A | Magnetron sputtering target and cathode assembly | Electricity | 69 | Expired |
| US4871433A | Method and apparatus for improving the uniformity ion bombardment in a magnetron sputtering system | Chemistry; Metallurgy | 62 | Expired |
| US4581118A | Shaped field magnetron electrode | Chemistry; Metallurgy | 53 | Expired |
| US5223108A | Extended lifetime collimator | Electricity | 53 | Expired |
| US5562819A | Apparatus for trapping, signalling presence of and collecting debris in waterways | Performing Operations; Transporting | 47 | Expired |
| US5795448A | Magnetic device for rotating a substrate | Chemistry; Metallurgy | 45 | Expired |
| US3991149A | Method for controlling the thickness of ceramic tape | Performing Operations; Transporting | 41 | Expired |
| US5130005A | Magnetron sputter coating method and apparatus with rotating magnet cathode | Electricity | 38 | Expired |
| US5925226A | Apparatus and method for clamping a substrate | Electricity | 36 | Expired |
| US5174875A | Method of enhancing the performance of a magnetron sputtering target | Electricity | 34 | Expired |
| US3953703A | Method for drying ceramic tape | Chemistry; Metallurgy | 33 | Expired |
| US5632869A | Method of pretexturing a cathode sputtering target and sputter coating an article therewith | Electricity | 32 | Expired |
| US5154730A | Semiconductor wafer processing module having an inclined rotating wafer handling turret and a method of using the module | Electricity | 32 | Expired |
| US5346601A | Sputter coating collimator with integral reactive gas distribution | Chemistry; Metallurgy | 29 | Expired |
| US4472259A | Focusing magnetron sputtering apparatus | Electricity | 29 | Expired |
| US4525262A | Magnetron reactive bias sputtering method and apparatus | Electricity | 28 | Expired |
| US5879524A | Composite backing plate for a sputtering target | Chemistry; Metallurgy | 23 | Expired |
| US4855033A | Cathode and target design for a sputter coating apparatus | Electricity | 22 | Expired |
| US5409590A | Target cooling and support for magnetron sputter coating apparatus | Electricity | 21 | Expired |
| US6224724A | Physical vapor processing of a surface with non-uniformity compensation | Electricity | 20 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.