Patent · US Expired

Exposure process

US4267259A · kind A · utility

3Cited by

2References

10Claims

0Family size

Assignee

International Business Machines Corporation · US

Inventors

Harald Bohlen · Eppelheim, DE
Johann Greschner · Neckartenzlingen, DE
Werner Kulcke · Eppelheim, DE
Peter Nehmiz · Stuttgart, DE

Key dates

Filing date	Feb 16, 1979
Grant date	May 12, 1981
Priority date	—
Expiry date	Feb 16, 1999

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/168
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

Radiation sensitive layers are x-ray exposed by providing a metal mask pattern on the layer through which the layer is exposed. The metal mask pattern is formed by applying a blanket metal layer to the radiation sensitive layer followed by an electron beam sensitive resist layer which is patterned by an electron beam exposure process. The exposed portions of the metal layer are then etched away to form the metal mask pattern.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.