Method of shadow printing exposure
US4334156A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 28, 1979 |
| Grant date | Jun 8, 1982 |
| Priority date | — |
| Expiry date | Aug 28, 1999 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3007
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of pattern exposing an energy beam sensitive target surface to a particle beam by proximity printing, wherein mask alignment errors such as lateral deviations, skew and linear distortions are determined and are effectively corrected by scanning the mask area being transferred with a controllably tilted particle beam, the particle beam having a diameter which is small compared to the area of the mask being scanned. At each scan point the particle beam is controllably tilted in the same azimuth direction as the alignment error for that point and by a tilt angle (taken with respect to the normal direction of the target surface) which has a tangent equal to the product of the magnitude of the alignment error and the separation between the mask and target surface at that point.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.