Positive resist compositions
US4397937A · kind A · utility
36Cited by
6References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 10, 1982 |
| Grant date | Aug 9, 1983 |
| Priority date | — |
| Expiry date | Feb 10, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/022
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Positive resists are formed from a soluble phenolic resin and a sensitizer which is a diester of a 1-oxo-2-diazonaphthalene sulfonic acid and of an unsymmetrical primary or secondary aliphatic diol which is a mixture of geometric and diastereoisomers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.