Microwave plasma source
US4433228A · kind A · utility
33Cited by
4References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 10, 1981 |
| Grant date | Feb 21, 1984 |
| Priority date | — |
| Expiry date | Nov 10, 2001 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32293
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The microwave plasma source of this invention comprises a vacuum room which forms a discharging space with discharge gas introduced therein, a means for conducting the microwave to the discharging space so that the microwave electric field is provided in the discharging space, and a means for providing the magnetic field in the discharging space located on the microwave propagating path and made up of a permanent magnet which virtually propagates the microwave.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.