Method for dose calculation of photolithography projection printers through bleaching of photo-active compound in a photoresist
US4474864A · kind A · utility
10Cited by
8References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 8, 1983 |
| Grant date | Oct 2, 1984 |
| Priority date | — |
| Expiry date | Jul 8, 2003 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for setting the exposure speed of photolithography instruments is described, using a method of dosimetry based on photoactive compound bleaching of photoresist. A curve of light absorbance to exposure speed and a calibration curve of light absorbance to dose are determined for a photoresist. The exposure speed for any desired degree of resist bleaching can be set using the first curve, and the exposure speed for a predetermined dosage can be set by determining the common light absorbance value on the exposure speed and dosage curves.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.