Ming-Fea Chow
6Patents
6h-index
21Co-inventors
55Inventor score
Filing activity: Dec 30, 1982 → Sep 8, 1989
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4702792A | Method of forming fine conductive lines, patterns and connectors | Electricity | 100 | Expired |
| US4939070A | Thermally stable photoresists with high sensitivity | Emerging Cross-Sectional Technologies | 74 | Expired |
| US4810601A | Top imaged resists | Emerging Cross-Sectional Technologies | 42 | Expired |
| US4474864A | Method for dose calculation of photolithography projection printers through bleaching of photo-active compound in a photoresist | Physics | 10 | Expired |
| US4464458A | Process for forming resist masks utilizing O-quinone diazide and pyrene | Physics | 9 | Expired |
| US4942108A | Process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers | Physics | 9 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.