Apparatus for detecting the defect of pattern
US4479145A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 22, 1982 |
| Grant date | Oct 23, 1984 |
| Priority date | — |
| Expiry date | Jul 22, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A pattern examining in which a pattern on an examined object such as reticle or mask is scanned to produce image binary signals of picture elements; binary information corresponding to a local area on the examined object is serially extracted from the image binary signals; and shape detection is effected for detecting by means of the binary information whether or not the pattern in the local area possesses a determined geometric shape or characteristics. The result of the shape detection is compared with the information on design relating to the geometric shape or characteristics which the pattern on the examined object should possess.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.