Deep ultra-violet lithographic resists with diazohomotetramic acid compounds
US4522911A · kind A · utility
16Cited by
6References
7Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 28, 1983 |
| Grant date | Jun 11, 1985 |
| Priority date | — |
| Expiry date | Jun 28, 2003 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0163
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A lithographic resist for use with deep ultra-violet radiation comprising an acidic resin and a diazohomotetramic acid sensitizer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.