Patent · US Expired

Method of forming photovoltaic quality amorphous alloys by passivating defect states

US4569697A · kind A · utility

55Cited by
4References
33Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 26, 1983
Grant dateFeb 11, 1986
Priority date
Expiry dateAug 26, 2003

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50

Abstract

Relatively dense, photovoltaic quality amorphous alloys which are characterized by reduced density of defect states in the band gaps thereof and which are particularly suited for use in tandem photovoltaic devices are formed by evaporating amorphous germanium and amorphous silicon in an ultrahigh vacuum environment, diffusing a density of states reducing element into and through the amorphous material, and finally annealing the resultant amorphous alloy to complete the diffusion process. The amorphous alloy, so formed, is a substantially contaminant-free, substantially tetrahedrally coordinated material. Fluorine is the preferred density of states reducing element which is added to the amorphous material for reducing the density of states through compensation, and for orbital promotion and expansion.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.