High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution
US4601969A · kind A · utility
11Cited by
6References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 28, 1985 |
| Grant date | Jul 22, 1986 |
| Priority date | — |
| Expiry date | Mar 28, 2005 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0163
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.