Organosilicon compound and use thereof in photolithography
US4603195A · kind A · utility
11Cited by
1References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 30, 1983 |
| Grant date | Jul 29, 1986 |
| Priority date | — |
| Expiry date | Dec 30, 2003 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0754
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A composition obtained by interracting a quinone diazo compound and an organosilicon compound; and use thereof in lithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.