Target for sputtering
US4610774A · kind A · utility
29Cited by
7References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 14, 1985 |
| Grant date | Sep 9, 1986 |
| Priority date | — |
| Expiry date | Nov 14, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3473
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A sputtering target structure suitable for use with a planar magnetron sputtering electrode device has a plurality of annular target members arranged concentrically. The annular target member is provided with either an annular groove for concentration of an electric field or an annular wall for repelling electrons.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.