Pattern checking apparatus
US4628531A · kind A · utility
78Cited by
6References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 27, 1984 |
| Grant date | Dec 9, 1986 |
| Priority date | — |
| Expiry date | Feb 27, 2004 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A pattern checking apparatus carries out the detection of candidate defects through a primary selection with a sensitivity high enough to detect any existing defect, and then carries out a detailed analysis by a controlling processor for a pattern including the periphery of the detected candidate defect through a secondary selection in which a candidate defect which is not a defect in a practical sense is removed from candidates, so that only real defects are detected.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.