Patent · US Expired

Position detection method and apparatus

US4655598A · kind A · utility

31Cited by
2References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 18, 1985
Grant dateApr 7, 1987
Priority date
Expiry dateNov 18, 2005

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F9/7049
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Position detecting method and a apparatus detect a position of substrate formed with a diffraction grating mark and a linearly extending stepped edge mark spaced from the diffraction grating. In the method and apparatus, those marks are relatively scanned by light beam, and position of the substrate is detected based on light information generated by both the marks and the scanning position.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.