Seiro Murakami
15Patents
12h-index
19Co-inventors
71Inventor score
Filing activity: Dec 14, 1984 → Apr 29, 2003
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5448332A | Exposure method and apparatus | Physics | 419 | Expired |
| US6608681B2 | Exposure method and apparatus | Physics | 130 | Expired |
| US5883704A | Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system | Physics | 114 | Expired |
| US5693439A | Exposure method and apparatus | Physics | 98 | Expired |
| US4860374A | Apparatus for detecting position of reference pattern | Physics | 89 | Expired |
| US6433872B1 | Exposure method and apparatus | Physics | 83 | Expired |
| US4677301A | Alignment apparatus | Physics | 77 | Expired |
| US5739899A | Projection exposure apparatus correcting tilt of telecentricity | Physics | 54 | Expired |
| US5464715A | Method of driving mask stage and method of mask alignment | Physics | 37 | Expired |
| US4655598A | Position detection method and apparatus | Physics | 31 | Expired |
| US4639604A | Method and apparatus for detecting an edge position of a pattern and eliminating overlapping pattern signals | Physics | 20 | Expired |
| US4702606A | Position detecting system | Physics | 19 | Expired |
| USRE38320E1 | Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system | General | 9 | Expired |
| USRE38113E1 | Method of driving mask stage and method of mask alignment | General | 7 | Expired |
| US6894763B2 | Exposure apparatus and methods utilizing plural mask and object stages movable in opposite directions, and methods of producing devices using the same | Physics | 7 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.