Rotatable and translatable mounting mechanism for a specimen pattern in optical processing apparatus
US4659172A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | May 20, 1985 |
| Grant date | Apr 21, 1987 |
| Priority date | — |
| Expiry date | May 20, 2005 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V10/88
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A translatable and rotatable mechanism is employed in optical processing apparatus for exposing a specimen pattern and inspecting light pattern or image developed from it. The mounting mechanism includes a plate that is rotatably mounted on a linear positioning table assembly. The plate includes a substrate arm and a camera arm that extend in opposite directions from the axis of rotation of the plate. The specimen pattern, such as a photomask, is positioned on the free end of the substrate arm, and a video camera is positioned on the free end of the camera arm. Whenever the plate is rotated to an exposure orientation, the photomask diffracts light rays emanating from a laser. The diffracted light rays interfere with a reference beam to form a hologram. Whenever the plate is rotated 180.degree. to an inspection orientation, a reconstructed imate of the photomask appears at the location where the photomask was positioned during exposure. The video camera is positioned directly beneath the reconstructed image and scans it by the translational movement of the positioning table. A microscope is mounted to a stationary support and is positioned over the photomask. The video camera and th…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.