Thermally stabilized photoresist images
US4701390A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 27, 1985 |
| Grant date | Oct 20, 1987 |
| Priority date | — |
| Expiry date | Nov 27, 2005 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/40
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photo resist image layers, particularly those used for high resolution geometries in microelectronic applications, are stabilized against distortion or degradation by the heat generated during subsequent etching, ion implantation processes and the like, by the application of a film of a thermally stabilizing agent prior to post-development bake of the image layer. The process serves to achieve thermal stabilization of the photoresist image layer without significantly affecting the ease of subsequent stripping of the layer. It is particularly effective when used to thermally stabilize positive resist images derived from photoresist systems based on novolak resins.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.