Pattern position detection apparatus using laser beam
US4744663A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 13, 1985 |
| Grant date | May 17, 1988 |
| Priority date | — |
| Expiry date | Dec 13, 2005 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70633
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pattern position detecting apparatus using a laser beam which is used for the recognition of an edge position, line width, etc., of a circuit pattern on a semiconductor wafer used in the fabrication of semiconductor devices. The apparatus includes an optical system for condensing a short-wave energy beam into a tiny spot and projecting it onto a sample, means for moving the sample and the spot relative to each other, first detecting means for receiving at least one of a reflection from a pattern and a scattering from a pattern edge, second detecting means for detecting a luminescence emitted from a pattern portion hit by the spot, and means for determining the position of the pattern in accordance with the detection information from the first and second detecting means and the scanning information of the spot.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.