Method of aligning a mask and a substrate relative to each other and arrangement for carrying out the method
US4778275A · kind A · utility
96Cited by
3References
20Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Sep 24, 1986 |
| Grant date | Oct 18, 1988 |
| Priority date | — |
| Expiry date | Sep 24, 2006 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7049
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and an arrangement for aligning relative to each other a mask pattern (C) and a substrate (W) which are both provided with two alignment marks wherein by using two separate alignment systems (AS.sub.1, AS.sub.2) which are each associated with one mask mark (M.sub.1, M.sub.2) and which are each used for aligning the substrate marks (P.sub.1, P.sub.2) relative to said mask marks the substrate (W) and the mask (M) can be aligned accurately without referring to the frame of the exposure apparatus and in addition it is possible to detect magnification errors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.