ASM Lithography
8Patents
0Active
8Granted
30Portfolio score
Filing activity: Sep 24, 1986 → Jul 6, 1998
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5969441A | Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device | Emerging Cross-Sectional Technologies | 907 | Expired |
| US5801832A | Method of and device for repetitively imaging a mask pattern on a substrate using five measuring axes | Physics | 102 | Expired |
| US4778275A | Method of aligning a mask and a substrate relative to each other and arrangement for carrying out the method | Physics | 96 | Expired |
| US5100237A | Apparatus for projecting a mask pattern on a substrate | Physics | 76 | Expired |
| US5481362A | Apparatus for projecting a mask pattern on a substrate | Physics | 56 | Expired |
| US5602683A | Lens system with lens elements arranged in a gas-filled holder and photolithographic apparatus including such a system | Physics | 36 | Expired |
| US6226075A | Supporting device provided with a gas spring with a gas bearing, and lithographic device provided with such supporting devices | Physics | 21 | Expired |
| US5889580A | Scanning-slit exposure device | Physics | 1 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.