Pattern masking method and an apparatus therefor
US4797939A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 2, 1986 |
| Grant date | Jan 10, 1989 |
| Priority date | — |
| Expiry date | Oct 2, 2006 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30141
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A binarized image data group of an inspected object for a plurality of pixels arrayed in the sub-scanning direction is sequentially created in order along the main scanning direction to determine whether or not the pattern of an inputted image corresponds to a standard through-hole pattern on the basis of the binarized image data group. When the determination is of yes, through-hole diameter masking data are sequentially created in order along the main scanning direction to sequentially perform masking processing on the binarized image data group of the inspected object arrayed in the sub-scanning direction. Thus, the through-hole pattern is automatically detected to be subjected to masking processing, whereby an inspected object having through-holes can be inspected by a pattern matching method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.